260224-K7-1.

Type: Synthesis show more

ObjectId: 30764

Created: 2/25/2026 5:10:58 PM by Bochum) Fernandes Joshua [joshua.fernandes@rub.de]

Updated: 2/25/2026 5:30:00 PM by Bochum) Fernandes Joshua [joshua.fernandes@rub.de]

Access: Public Sort Code (asc): 0

Description: 1. Deposition of ~10nm Ti adhesion layer 2. Deposition of ~80nm HEA layer 3. Deposition of ~5nm Pt layer

[no file attached]

No associated objects found.

Type	Name	Value	Comment
Int	Main4Printing	1	Set it up to 1 for the main synthesis document for printing
general process parameters
String	chamber	K7	K<i> (for example, "K7")
Int	problem occured?	0	1 - Yes, 0 - No
String	operator	Joshua
Float	start vacuum	1.69e-006	Torr
Float	process duration	2827	s
Float	substrate temperature	24	°C
Float	substrate rotation	30	RPM
String	process gas	Ar
Float	cathode tilt	10	mm
Float	process pressure	3.75	mTorr
target source configuration
Cathode 1
String	target material	Pt
String	target ID	2
Mag1-DC
Float	ignition power cathode 1	20	W
Float	pre clean power 1	20	W
Float	pre clean time 1	300	s
String	pre clean pressure cathode 1	10	mTorr
Float	power cathode 1	30	W
Float	set power cathode 1	30	W
Float	act power cathode 1	30	W
Float	voltage cathode 1	360	V
Float	current cathode 1	0.085	A
Cathode 2
String	target material	Ti
String	target ID	2
Mag2-DC
Float	ignition power cathode 2	20	W
Float	pre clean power 2	20	W
Float	pre clean time 2	300	s
Float	pre clean pressure cathode 2	10	mTorr
Float	power cathode 2	30	W
Float	set power cathode 2	30	W
Float	act power cathode 2	30	W
Float	voltage cathode 2	249	V
Float	current cathode 2	0.12	A
Cathode 3
String	target material	HEA
String	target ID	3
Mag3-DC
Float	ignition power cathode 3	20	W
Float	pre clean power 3	20	W
Float	pre clean time 3	300	s
Float	pre clean pressure cathode 3	10	mTorr
Float	power cathode 3	30	W
Float	set power cathode 3	30	W
Float	act power cathode 3	30	W
Float	voltage cathode 3	280	V
Float	current cathode 3	0.114	A

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